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01 Feb, 2023
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Downturn in Semiconductor Also Hits Materials, Parts, and Equipment Directly
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  • Hefei Rui-Li IC (Hefei Chang Xin) 19nm DRAM in 2018

Hefei Rui-Li IC (Hefei Chang Xin) 19nm DRAM in 2018

July 1, 2017September 10, 2019 CritMat Admin
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China, Fab Technology12-inch, 19nm, 2018, Chang Xin, China, DRAM, Elpida, employees, equipment, fab, Hefei, Hong Kong, Inotera, investment, manufacturing, memory, Micron, Nanya, people, production, R&D, Rui-Li, silicon, supply-chain, technology, wafer

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